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Supplementary Materials

Toward Tungsten Electrodeposition at Moderate Temperatures Below 100 °C Using

Chloroaluminate Ionic Liquids

Shota Higashino,1,2,* Yoshikazu Takeuchi,2 Masao Miyake,2 Takuma Sakai1, Takumi Ikenoue,2

Masakazu Tane,1 and Tetsuji Hirato2

1Graduate

School of Engineering, Osaka Metropolitan University, Sugimoto, Sumiyoshi-ku, Osaka

558-8585, Japan

2Graduate

School of Energy Science, Kyoto University, Yoshida-honmachi, Sakyo-ku, Kyoto 606-

8501, Japan

*Corresponding Author: higashino@omu.ac.jp

Results and discussion

Supplementary Figure S1. (a) SEM image of the Cu electrode surface after

potentiostatic electrolysis in the EMIC–AlCl3–WCl5 bath at +0.1 V and 80 °C. (b) EDX

spectrum for the dotted area in (a), where the deposits were completely exfoliated.

Supplementary Figure S2. (a) SEM image and (b) EDX spectrum of the Ni electrode

surface after potentiostatic electrolysis in the EMIC–AlCl3–WCl5–KF bath at +0.1 V and

80 °C.

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