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Electrodeposition of mirror surface β-W films in molten CsF–CsCl–WO₃

Meng, Xianduo Norikawa, Yutaro Nohira, Toshiyuki 京都大学 DOI:10.1016/j.elecom.2021.107139

2021.11

概要

In this study we report, for the first time, a thick β-W film with a mirror-like surface prepared through electrodeposition involving a CsF–CsCl eutectic melt combined with 2.0 mol% of WO₃ at 773 K. A smooth-surfaced β-W film with a thickness of 13 µm was obtained when galvanostatic electrolysis was performed at − 4 mA cm⁻². X-ray diffraction analysis revealed that the obtained β-W films have a strong preferred orientation along the {1 1 1} plane, which becomes stronger with decreasing current density. Surface and cross-sectional morphologies observed through scanning electron microscopy indicated that increasing the current density caused the growth of the electrodeposit to change from the field-oriented texture type to the unoriented dispersion type, in accordance with Fischer’s classification of electrodeposition. To the best of our knowledge, this is the first time that mirror-like metal films have been electrodeposited in a high temperature molten salt, not only for tungsten but for any metal.

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