[1] Q. H. Wang, K. Kalantar-Zadeh, A. Kis, J. N. Coleman, M. S. Strano, Nat. Nanotechnol. 7, 699
(2012).
[2] X. Tong, E. Ashalley, F. Lin, H. Li, Z. M. Wang, Nano-Micro Lett. 7, 203 (2015).
[3] A. Rai, H. C. P. Movva, A. Roy, D. Taneja, S. Chowdhury, and S. K. Banerjee, Crystals 8, 316 (2018).
[4] G. R. Bhimanapati, Z. Lin, V. Meunier, Y. Jung, J. Cha, S. Das, D. Xiao, Y. Son, M. S. Strano, V. R.
Cooper, L. Liang, S. G. Louie, E. Ringe, W. Zhou, S. S. Kim, R. R. Naik, B. G. Sumpter, H. Terrones,
F. Xia, Y. Wang, J. Zhu, D. Akinwande, N. Alem, J. A. Schuller, R. E. Schaak, M. Terrones, J. A.
Robinson, ACS Nano 9, 11509 (2015).
[5] A. Gupta, T. Sakthivel, S. Seal, Prog. Mater. Sci. 73, 44. (2015).
[6] M. Chhowalla, D. Jena, H. Zhang, Nat. Rev. Mater. 1, 16052 (2016).
[7] B. Radisavljevic, A. Radenovic, J. Brivio, V. Giacometti, A. Kis, Nat. Nanotechnol. 6, 147 (2011).
[8] B. Radisavljevic, A. Kis, Nat. Mater. 12, 815 (2013).
[9] Y. Zhang, J. Ye, Y. Matsuhashi, Y. Iwasa, Nano L ett. 12, 1136 (2012).
[10] A. T. Neal, H. Liu, M. Si, Y. Deng, J. Gu, P. D. Ye, ACS Nano 7, 7077 (2013).
[11] B. W. H. Baugher, H. O. H. Churchill, Y. Yang, P. Jarillo-Herrero, Nano Lett. 13, 4212 (2013).
[12] X. Cui, G.-H. Lee, Y. D. Kim, G. Arefe, P. Y. Huang, C.-H. Lee, D. A. Chenet, X. Zhang, L. Wang, F.
Ye, F. Pizzocchero, B. S. Jessen, K. Watanabe, T. Taniguchi, D. A. Muller, T. Low, P. Kim, J. Hone,
Nat. Nanotechnol. 10, 534 (2015).
[13] W. Zhu, T. Low, Y.-H. Lee, H. Wang, D. B. Farmer, J. Kong, F. Xia, P. Avouris, Nat. Commun. 5:3087
(2014).
[14] A. Allain, J. Kang, K. Banerjee, A. Kis, Nat. Mater. 14, 1195 (2015).
[15] I. Popov, G. Seifert, D. Tomanek, Phys. Rev. Lett. 108, 156802 (2012).
[16] S. McDonnell, R. Addou, C. Buie, R. M. Wallace, C. L. Hinkle, ACS Nano 8, 2880 (2014).
[17] S. Walia, S. Balendhran, Y. Wang, R. A. Kadir, A. S. Zoolfakar, P. Atkin, J. Z. Ou, S. Sriram, K.
Kalantar-zadeh, M. Bhaskaran, Appl. Phys. Lett. 103, 232105 (2013).
[18] H. Liu, M. Si, Y. Deng, A. T. Neal, Y. Du, S. Najmaei, P. M. Ajayan, J. Lou, P. D. Ye, ACS Nano 8,
1031 (2014).
[19] W. Liu, J. Kang, D. Sarkar, Y. Khatami, D. Jena, K. Banerjee, Nano Lett. 13, 1983 (2013).
[20] S, Das, H.-Y. Chen, A. V. Penumatcha, J. Appenzeller, Nano Lett. 13, 100 (2013).
[21] C. D. English, G. Shine, V. E. Dorgan, K. C. Saraswat, E. Pop, Nano Lett. 16, 3824 (2016).
[22] V. K. Sangwan, H. N. Arnold, D. Jariwala, T. J. Marks, L. J. Lauhon, and M. C. Hersam, Nano Lett. 13,
4351 (2013).
[23] I. Martinez, M. Ribeiro, P. Andres, L. E. Hueso, F. Casanova, and F. G. Aliev, Phys. Rev. Applied 7,
034034 (2017).
[24] S. M. Sze, Semiconductor Devices: Physics and Technology (Wiley, New York, 2002) 2nd ed.
[25] F. Werner, J. Appl. Phys. 122, 135306 (2017).
[26] D. K. Schroder, Semiconductor Material and Device Characterization (Wiley, New Jersey, 2006).
[27] K. S. Novoselov, A. K. Geim, S. V. Morozov, D. Jiang, Y. Zhang, S. V. Dubonos, I. V. Grigorieva, A. A.
Firsov, Science 306, 666 (2004).
[28] A. Castellanos-Gomez, M. Buscema, R. Molenaar, V. Singh, L. Janssen, H. S. J. van der Zant, G. A.
Steele, 2D Mater. 1, 011002 (2014).
[29] H.-J. Kwon, J. Jang, S. Kim, V. Subramanian, and C. P. Grigoropoulos, Appl. Phys. Lett. 105, 152105
(2014).
[30] J. Kang, W. Liu, and K. Banerjee, and A. Kis, Appl. Phys. Lett. 104, 093106 (2014).
[31] F. N. Hooge, Phys. Lett. 29A, 139 (1969).
Figure captions
Fig. 1. Schematics of setup for measurement of frequency response of the lock-in amplifier (a) and magnet
(b). Dependence of Vmeas on Vin and that of B0 on I0 are measured, where Vin, B0, and I0, are the oscillation
amplitudes of the input signal, magnetic field, and magnet current, respectively. Vmeas is the amplitude
recorded by the lock-in amplifier. The magnetic field is measured using a Hall sensor, of which the Hall
voltage is read out using the differential amplifier and oscilloscope. In the actual Hall effect measurements
on MoS2 devices, the Hall sensor is replaced with a MoS2 flake, and the very small output signal of the
differential amplifier is fed into the lock-in amplifier.
Fig. 2. Frequency characteristics of the ac Hall effect measurement system used in this work. The ratios
Vmeas/Vin (black squares) and B0/I0 (blue triangles) are shown as a function of frequency, where Vmeas Vin, B0,
and I0 are the voltage amplitude measured by the lock-in amplifier, the amplitudes of input-voltage
oscillations, magnetic field measured by a Hall sensor, and the applied ac magnet current, respectively.
Here, B0/I0 is shown as a normalized value so that the value is unity as the frequency tends to zero.
Fig. 3. The ratio Vmeas/I0 as a function of frequency, which is the overall frequency characteristics of the ac
Hall effect measurement system. When the amplitude of the magnet current is fixed, the measured Hall
voltage is proportional to this value.
Fig. 4. Optical micrograph of the MoS2 FET device. Scale bar is 50 m. The dc bias current flowed
between the drain and source terminals (D and S). The Hall voltage was measured using the Hall voltage
probes (V1 and V3). The four-terminal resistance was obtained using the voltage between the voltage probes
(V1 and V2). The channel length between the drain and source terminals and the channel width were L =
26m and W = 65 m, respectively.
Fig. 5. The four-terminal sheet conductance Gs of the MoS2 FET device as a function of Vg. The field effect
mobility is derived from the slope of the Gs–Vg curve in the linear regime as shown in the text.
Fig. 6. Time traces of drain-to-source voltage Vds and amplitude Vm* of the oscillation component of the
transverse voltage that are in phase with magnetic field oscillations, acquired by the lock-in amplifier. The
unit of time T was 160 s. Vds was switched between 2.5 V and –2.5 V, with a period of 4T. For each
value of Vds, Vm* was recorded for the time interval of T after waiting time of T, so that the device
reaches an equilibrium state.
Fig. 7. Transverse resistance Rxy as a function of B (amplitude of ac magnetic fields) at Vg = 50 V. From the
slope of the fitted line, the sheet electron density was estimated to be 3.7 × 1012 cm-2. This value is different
from that shown in Fig. 8 (2.7 × 1012 cm-2), because the data of Fig. 7 were measured six months after the
measurement for Fig. 8.
Fig. 8. The sheet electron density n and the Hall mobility H as a function of Vg acquired in the ac Hall
effect measurements. H is obtained from n and the four-terminal sheet resistance. The frequency of the ac
magnetic fields was 0.9 Hz in this measurement.
1.0
0.8
0.8
0.6
0.6
0.4
0.4
0.2
0.2
0.0
0.01
0.1
10
0.0
100
Vmeas / I0 (normalized)
1.0
B0 / I0 (normalized)
Vmeas / Vin
Fig. 1
0.5
0.4
0.3
0.2
0.1
0.0
10
Frequency (Hz)
Frequency (Hz)
Fig. 2
Fig. 3
Fig. 4
10
Vds (V)
Time / T
Vds = 2.5 V
Vds = -2.5 V
-100
-40 -20
20
40
60
Vg (V)
Time / T
Fig. 6
16
14
-2
n (10 cm )
10
12
12
0.01
0.02
0.03
B (T)
-40
-20
20
Vg (V)
Fig. 7
Fig. 8
11
dn = Ci
dVg e
40
60
Fig. 5
0.00
H (cm /Vs)
100
Rxy ()
200
Vm (V)
Gs (S)
-1
-2
-3
...