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大学・研究所にある論文を検索できる 「An abrasive-free chemical polishing method assisted by nickel catalyst generated by in situ electrochemical plating」の論文概要。リケラボ論文検索は、全国の大学リポジトリにある学位論文・教授論文を一括検索できる論文検索サービスです。
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An abrasive-free chemical polishing method assisted by nickel catalyst generated by in situ electrochemical plating

Toh, Daisetsu 大阪大学

2020.04.13

概要

An abrasive-free polishing method using water and a Pt catalyst, called catalyst-referred etching (CARE), has been developed for the finishing of optical and semiconductor surfaces. This method realizes well-ordered surfaces with a smoothness of several tens of picometers without crystallographic disturbance. In this study, we propose a new CARE method using a Ni catalyst with in situ electrochemical plating and dissolution, which enable enhancing the catalytic capability of Ni. This method has advantages to realize more than ten times higher removal rate and better stability compared with the conventional CARE method.

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